Semiconductor

Precise porous components for consistent electrical and flow properties.

Improve purity and performance

Usage of our POREX® porous materials assures your products and processes meet the highest quality and performance standards. Our high-purity POREX Virtek™ PTFE, PE and PP products have precise porosity allowing for consistent electrical and flow properties, along with:

  • Very low contamination for critical processes.
  • Precise pore size and volume control and customization to multiple shapes and thicknesses.
  • Low dielectric constant and dielectric losses for maximum efficiency.
Diffusion tubes

Diffusion Tubes

Enhance semiconductor processing with pure materials

Porous vacuum components

Porous Vacuum Components

Excellent performance with porous vacuum components

Low dielectric material

Low Dielectric Material

Lower energy absorption for high-frequency applications

diffusion tubes details

Diffusion Tubes

Enhance semiconductor processing with pure materials

Our high-purity diffusion tubes allow semiconductor processing facilities a precise way to diffuse, filter and distribute process gases.

Specifically designed to precise flow and dimensional tolerances, POREX® diffusion tubes:

  • Ensure purityMaterial is backed by the Certified Pure POREX™ program of independent laboratory testing of leachables, extractables and interfering substances.
  • Deliver precise flow rates and tolerances–Engineered for tight pore size and volume control.
  • Improve process effectiveness–Design is customizable per application requirements.

Porous Vacuum Components

Excellent performance with porous vacuum componets

Manufacturers around the world trust our porous materials to deliver excellent performance when used as vacuum components. Anti-static additives can also be introduced for applications that require conductivity.

  • Ensure purity–Material is backed by the Certified Pure POREX™ program of independent laboratory testing of leachables, extractables and interfering substances.
  • Deliver precise flow rates and tolerances–Engineered for tight pore size and volume control.
  • Improve device effectiveness–Design is customizable per application and can incorporate anti-static properties.
porous vacuum components details

Low Dielectric Material

dielectric material details

Lower energy absorption for high-frequency applications

High-frequency applications, such as antennae systems, require low energy absorption. Trusted by manufacturers around the world, our low dielectric materials:

  • Ensure purity and manufacturability–POREX Virtek™ PTFE is pure PTFE and does not require a backing or support scrim like expanded PTFE.  This allows for assembly via heat or vibrational welding.
  • Deliver low dielectric constants–Offer constants as low as 1.4.
  • Surface structure allows printing or plating of metals.
  • Improve device effectiveness–Material can be made into two and three-dimensions shapes from a variety of substrates, plus the ability to trap functional additives or catalysts within the pore structure.

 

Example of POREX® Porous PTFE Dielectric Properties
Gap Z0 K Tan 𝛿 Qu Qt F,GHz dB Unc. Qt Unc. F,kHz Unc.dB sd/fit #pts
15 38.5 1.46 0.0012 231.8 231.1 0.81420 50.79 0.1452 0.5 0.002 0.00913 101s
35 38.5 1.46 0.0008 393.9 392.8 2.44068 50.76 0.5300 1.9 0.003 0.02036 101s
40 38.5 1.46 0.0007 443.6 442.2 3.25346 50.25 0.4400 1.6 0.002 0.01461 101s
55 38.5 1.46 0.0006 582.3 580.6 5.69387 50.80 0.7073 2.6 0.003 0.01801 101s
64 38.5 1.46 0.0006 651.4 649.5 8.13362 51.02 1.2086 5.1 0.005 0.02725 101s
75 38.5 1.46 0.0004 770.1 767.9 10.57427 50.74 1.0921 4.2 0.003 0.02040 101s
90 38.5 1.46 0.0005 793.1 790.6 13.8262 50.26 1.5756 7.7 0.005 0.02973 101s
Example based on PM 2010. Pore size: 15-25µ, porosity: 50-60%

 

Related Resources:

pdf download Datasheet: PTFE Fact Sheet