Improve purity and performance
Usage of our POREX® porous materials assures your products and processes meet the highest quality and performance standards. Our high-purity POREX Virtek® PTFE, PE and PP products have precise porosity allowing for consistent electrical and flow properties, along with:
- Very low contamination for critical processes.
- Precise pore size and volume control and customization to multiple shapes and thicknesses.
- Low dielectric constant and dielectric losses for maximum efficiency.

Diffusion Tubes
Enhance semiconductor processing with pure materials

Porous Vacuum Components
Excellent performance with porous vacuum components

Low Dielectric Material
Lower energy absorption for high-frequency applications

Diffusion Tubes
Enhance semiconductor processing with pure materials
Our high-purity diffusion tubes allow semiconductor processing facilities a precise way to diffuse, filter and distribute process gases.
Specifically designed to precise flow and dimensional tolerances, POREX® diffusion tubes:
- Ensure purity–Material is backed by the Certified Pure POREX® program of independent laboratory testing of leachables, extractables and interfering substances.
- Deliver precise flow rates and tolerances–Engineered for tight pore size and volume control.
- Improve process effectiveness–Design is customizable per application requirements.

Porous Vacuum Components
Excellent performance with porous vacuum component
- Ensure purity–Material is backed by the Certified Pure POREX™ program of independent laboratory testing of leachables, extractables and interfering substances.
- Deliver precise flow rates and tolerances–Engineered for tight pore size and volume control.
- Improve device effectiveness–Design is customizable per application and can incorporate anti-static properties.
Manufacturers around the world trust our porous materials to deliver excellent performance when used as vacuum components. Anti-static additives can also be introduced for applications that require conductivity.
Low Dielectric Material

Lower energy absorption for high-frequency applications
High-frequency applications, such as antennae systems, require low energy absorption. Trusted by manufacturers around the world, our low dielectric materials:
- Ensure purity and manufacturability–POREX Virtek PTFE is pure PTFE and does not require a backing or support scrim like expanded PTFE. This allows for assembly via heat or vibrational welding.
- Deliver low dielectric constants–Offer constants as low as 1.4.
- Surface structure allows printing or plating of metals.
- Improve device effectiveness–Material can be made into two and three-dimensions shapes from a variety of substrates, plus the ability to trap functional additives or catalysts within the pore structure.
Example of POREX Porous PTFE Dielectric Properties | ||||||||||||
Gap | Z0 | K | Tan 𝛿 | Qu | Qt | F,GHz | dB | Unc. Qt | Unc. F,kHz | Unc.dB | sd/fit | #pts |
---|---|---|---|---|---|---|---|---|---|---|---|---|
15 | 38.5 | 1.46 | 0.0012 | 231.8 | 231.1 | 0.81420 | 50.79 | 0.1452 | 0.5 | 0.002 | 0.00913 | 101s |
35 | 38.5 | 1.46 | 0.0008 | 393.9 | 392.8 | 2.44068 | 50.76 | 0.5300 | 1.9 | 0.003 | 0.02036 | 101s |
40 | 38.5 | 1.46 | 0.0007 | 443.6 | 442.2 | 3.25346 | 50.25 | 0.4400 | 1.6 | 0.002 | 0.01461 | 101s |
55 | 38.5 | 1.46 | 0.0006 | 582.3 | 580.6 | 5.69387 | 50.80 | 0.7073 | 2.6 | 0.003 | 0.01801 | 101s |
64 | 38.5 | 1.46 | 0.0006 | 651.4 | 649.5 | 8.13362 | 51.02 | 1.2086 | 5.1 | 0.005 | 0.02725 | 101s |
75 | 38.5 | 1.46 | 0.0004 | 770.1 | 767.9 | 10.57427 | 50.74 | 1.0921 | 4.2 | 0.003 | 0.02040 | 101s |
90 | 38.5 | 1.46 | 0.0005 | 793.1 | 790.6 | 13.8262 | 50.26 | 1.5756 | 7.7 | 0.005 | 0.02973 | 101s |
Example based on PM 2010. Pore size: 15-25µ, porosity: 50-60% |
Related Resources:
Datasheet: PTFE Fact Sheet